Modeling 3D ICP Plasma
Inductively Coupled Plasma (ICP) Reactors are widely used in semiconductor manufacturing to efficiently generate high density plasma for wafer processing
Watch this application-specific 45-minute webinar where we showcase ESI's multi-physics solutions used to model ICP chambers including various asymmetric's in geometry and complexity in chemistry.
- High-fidelity 3D simulation incorporating chamber, coil and wafer geometric complexity
- Parametric design space exploration including coil design, Faraday shield placement. power, pressure, flowrate and plasma chemistry
- ICP reactors performance optimization and process calibration