Modeling 3D ICP Plasma

cap semi

Click to view recording

Inductively Coupled Plasma (ICP) Reactors are widely used in semiconductor manufacturing to efficiently generate high density plasma for wafer processing

Watch this application-specific 45-minute webinar where we showcase ESI's multi-physics solutions used to model ICP chambers including various asymmetric's in geometry and complexity in chemistry.

Key Takeaways 

  • High-fidelity 3D simulation incorporating chamber, coil and wafer geometric complexity
  • Parametric design space exploration including coil design, Faraday shield placement. power, pressure, flowrate and plasma chemistry
  • ICP reactors performance optimization and process calibration