Virtual Reactor Design and Process Validation of 3D ICP Chambers
8 April 2021
United States
2PM EDT | 11AM EST
45 Minutes
United States
2PM EDT | 11AM EST
45 Minutes
Fadi Ben Achour
fadi.benachour [at] esi-group.com (fadi[dot]benachour[at]esi-group[dot]com)
fadi.benachour [at] esi-group.com (fadi[dot]benachour[at]esi-group[dot]com)
Inductively Coupled Plasma (ICP) Reactors are widely used in semiconductor manufacturing to efficiently generate high-density plasma for wafer processing.
Join this INTEL exclusive ICP Chamber modeling webinar showcasing ESI's multi-physics solutions evaluated and licensed by Intel in 2020. Topics discussed will include various asymmetries in geometry and complexity in chemistry.
KEY TAKEAWAYS
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High-fidelity 3D simulation incorporating chamber, coil and wafer geometric complexity
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Performance optimization and process calibration
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Parametric design space exploration including coil design, shield placement, power, pressure, flowrate and plasma chemistry