Virtual Reactor Design and Process Validation of 3D ICP Chambers

2 September 2020
United States
11am PST
1 Hour

Inductively Coupled Plasma (ICP) Reactors are widely used in semiconductor manufacturing to efficiently generate high-density plasma for wafer processing.


Join this application-specific, 45-minute webinar where we showcase ESI's multi-physics solutions used to model ICP chambers including various asymmetric's in geometry and complexity in chemistry. 



In case you don't see the form or can't register please follow this link.


  • High-fidelity 3D simulation incorporating chamber, coil and wafer geometric complexity
  • Parametric design space exploration including coil design, Faraday shield placement. power, pressure, flowrate and plasma chemistry
  • ICP reactors performance optimization and process calibration