Virtual Reactor Design and Process Validation of 3D ICP Chambers
2 September 2020
Inductively Coupled Plasma (ICP) Reactors are widely used in semiconductor manufacturing to efficiently generate high-density plasma for wafer processing.
Join this application-specific, 45-minute webinar where we showcase ESI's multi-physics solutions used to model ICP chambers including various asymmetric's in geometry and complexity in chemistry.
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High-fidelity 3D simulation incorporating chamber, coil and wafer geometric complexity
Parametric design space exploration including coil design, Faraday shield placement. power, pressure, flowrate and plasma chemistry
ICP reactors performance optimization and process calibration