Virtual Reactor Design and Process Validation of 3D ICP Chambers

Name: Virtual Reactor Design and Process Validation of 3D ICP Chambers
Start: Wed, 09/02/2020 - 12:00
End: Wed, 09/02/2020 - 12:00
Location: United States

2 Septembre 2020
United States
11am PST
1 Hour

Inductively Coupled Plasma (ICP) Reactors are widely used in semiconductor manufacturing to efficiently generate high-density plasma for wafer processing.

Join this application-specific, 45-minute webinar where we showcase ESI's multi-physics solutions used to model ICP chambers including various asymmetric's in geometry and complexity in chemistry.

ACCESS THE ON-DEMAND

Please accept marketing-cookies to see this form.

In case you don't see the form or can't register please follow this link.

KEY TAKEAWAYS

High-fidelity 3D simulation incorporating chamber, coil and wafer geometric complexity
Parametric design space exploration including coil design, Faraday shield placement. power, pressure, flowrate and plasma chemistry
ICP reactors performance optimization and process calibration

Virtual Reactor Design and Process Validation of 3D ICP Chambers

Inductively Coupled Plasma (ICP) Reactors are widely used in semiconductor manufacturing to efficiently generate high-density plasma for wafer processing.

KEY TAKEAWAYS

High-fidelity 3D simulation incorporating chamber, coil and wafer geometric complexity

Parametric design space exploration including coil design, Faraday shield placement. power, pressure, flowrate and plasma chemistry

ICP reactors performance optimization and process calibration