Virtual Reactor Design and Process Validation of 3D ICP Chambers
2 九月 2020
United States
11am PST
1 Hour
United States
11am PST
1 Hour
Inductively Coupled Plasma (ICP) Reactors are widely used in semiconductor manufacturing to efficiently generate high-density plasma for wafer processing.
Join this application-specific, 45-minute webinar where we showcase ESI's multi-physics solutions used to model ICP chambers including various asymmetric's in geometry and complexity in chemistry.
ACCESS THE ON-DEMAND
KEY TAKEAWAYS
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High-fidelity 3D simulation incorporating chamber, coil and wafer geometric complexity
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Parametric design space exploration including coil design, Faraday shield placement. power, pressure, flowrate and plasma chemistry
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ICP reactors performance optimization and process calibration