Modeling 3D ICP Plasma

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Inductively Coupled Plasma (ICP) Reactors are widely used in semiconductor manufacturing to efficiently generate high density plasma for wafer processing

Watch this application-specific 45-minute webinar where we showcase ESI's multi-physics solutions used to model ICP chambers including various asymmetric's in geometry and complexity in chemistry.

Key Takeaways 

  • High-fidelity 3D simulation incorporating chamber, coil and wafer geometric complexity
  • Parametric design space exploration including coil design, Faraday shield placement. power, pressure, flowrate and plasma chemistry
  • ICP reactors performance optimization and process calibration