Workshop
Simulation-Based Design Solutions for Semiconductor Equipment and Processes
| When |
2008-06-11 09:00
2008-06-11 14:30
2008-06-11 |
|---|---|
| Where | Cupertino, CA - USA |
| Add event to calendar |
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ESI Group and HP present a workshop on simulation-based-design solutions for semiconductor equipment and processes.
ESI Group provides advanced simulation tools and services for designing and optimizing semiconductor equipment and processes. ESI's Multi-Physics software, CFD-ACE+, provides the unique capacity to perform high fidelity three-dimensional simulations of heat and mass transport with complex multi-step gas-phase and surface reactions for industrial applications.
CFD-ACE+: Multi-Physics Solution for Semiconductor Processing
The emphasis of this event will be on semiconductor processing applications, but engineers interested in CFD simulation in any field are welcome.
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Reactor Modeling |
Prediction of Film Shape & Local Deposition Rate |
What the experts have to say about CFD-ACE+
"The CFD-ACE+ simulation package has been an integral part of our design process for many years. Virtual prototyping with CFD-ACE+ does deliver accurate results reliably and leads to performance improvements, yield enhancements and significant cost savings." - AIXTRON AG
Applications
• Reactor chamber flow and heat analysis,
• Showerhead design,
• Feature-scale evolution,
• Plasma enhanced processes,
• Rapid thermal processing,
• Etching & electroplating,
• Deposition (CVD, PVD, ALD)
Who Should Attend?
• Semiconductor process engineers,
• Current CFD users and managers,
• CAE professionals,
• YOU
Why You Should Attend?
By attending this workshop, you will learn how simulation-based design techniques can help you:
• Design better products,
• Increase yield,
• Identify and eliminate downstream manufacturing issues,
• Learn the latest breakthroughs in scalable high performance compute clusters delivering a teraflop of performance in less than a two square foot footprint,
• Bring new products to market faster,
• SAVE MONEY
Registration
Access is limited, and your registration is highly recommended. Please register today online by clicking here.

